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India, US Sign ‘Pax Silica’ Declaration to Boost Semiconductor and AI Cooperation
Feb 20, 2026India and the United States on Friday signed the ‘Pax Silica’ declaration at the India AI Impact Summit in New Delhi, marking a major step toward strengthening cooperation in critical minerals, semiconductors and artificial intelligence.
The declaration aims to deepen collaboration in building a secure and resilient global silicon ecosystem, covering the entire value chain from critical mineral production and chip manufacturing to AI deployment. The initiative seeks to reduce coercive dependencies in technology supply chains and promote trusted industrial partnerships between like-minded nations.
Presiding over the signing ceremony, Union Minister for Electronics and Information Technology Ashwini Vaishnaw said India’s goal is to assume a leadership role in the semiconductor and electronics sectors. He noted that Indian engineers are designing some of the world’s most advanced two-nanometer chips.
Mr. Vaishnaw said the semiconductor industry would require a talent pool of more than 10 lakh professionals, which India is preparing to develop domestically. He added that students from 315 universities and colleges across the country are already engaged in chip design initiatives.
Speaking at the event, US Ambassador to India Sergio Gor described the partnership as a significant milestone in bilateral ties. He said cooperation between the two countries — spanning trade agreements, the Pax Silica initiative and defence engagement — holds immense potential.
Mr. Gor stated that the coalition aims to shape the 21st-century economic and technological order by securing the full silicon stack, from raw materials and semiconductor fabrication to AI systems. He emphasised that Pax Silica seeks to replace dependency-driven supply chains with trusted partnerships that strengthen free markets and advance reliable AI globally.
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